Thermal Evaporation System
Technical and Characterization Specifications:
- It is an thin film deposition
- The source material evaporated in a vacuum
- In high vacuum evaporated particles can travel directly to the deposition target without colliding with the background gas
- Backing pump Pressure : 5*10-2
- Roughing Pressure : 5*10-2
- Turbo controller in pennigauge - 1*10-6
- Quartz crystal is used to monitor the thickness of the deposited film and also to control the rate of evaporation
- Temperature range : 250 K
- Primary Current range: 0.81
- Typical filament currents are 100-200Amps
- Nitogen gas are used
- Heating filaments/boats : Tungsten, molybdenum
- Maximum deposition thickness that can be achieved is 600nm.
- Substrate temperature can be increased up to 150oC .
