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BEGIN:VTIMEZONE
TZID:Indian/Mahe
BEGIN:STANDARD
DTSTART:20170916T143000
RDATE:20380119T071407
TZOFFSETFROM:+0400
TZOFFSETTO:+0400
TZNAME:Indian/Mahe +04
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BEGIN:VEVENT
UID:ac13505052db16cc40c1e05a198c572f
CATEGORIES:CeNS Seminar
CREATED:20180912T111459
SUMMARY:Introduction and range of Mask Aligner and Nano Imprint Lithography for modern research
LOCATION:Lecture Hall
DESCRIPTION;ENCODING=QUOTED-PRINTABLE:Seminar\n"Introduction and range of Mask Aligner and Nano Imprint Lithograp
 hy for\nmodern research"\n By\nMr. Peter Lee\nDirector, MIDAS Systems 
 Company Limited South Korea\n On\nMonday, 17 September 2018\nTime: 02.
 30 P.M.\n Venue: Auditorium\n\n This event was imported from: https://
 cens.res.in/hi/events/eventdetail/200/-/introduction-and-range-of-mask-alig
 ner-and-nano-imprint-lithography-for-modern-research?tmpl=component
DTSTAMP:20260405T191841Z
DTSTART;TZID=Indian/Mahe:20180917T143000
DTEND;TZID=Indian/Mahe:20180917T153000
SEQUENCE:0
TRANSP:OPAQUE
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