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METHOD:PUBLISH
BEGIN:VTIMEZONE
TZID:Indian/Mahe
BEGIN:STANDARD
DTSTART:20170916T143000
RDATE:20380119T071407
TZOFFSETFROM:+0400
TZOFFSETTO:+0400
TZNAME:Indian/Mahe +04
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BEGIN:VEVENT
UID:ac13505052db16cc40c1e05a198c572f
CATEGORIES:CeNS Seminar
CREATED:20180912T111459
SUMMARY:Introduction and range of Mask Aligner and Nano Imprint Lithography for modern research
LOCATION:Lecture Hall
DESCRIPTION;ENCODING=QUOTED-PRINTABLE:<p style="text-align: center;">Seminar</p><p style="text-align: center;"><s
 trong>"Introduction and range of Mask Aligner and Nano Imprint Lithography 
 for</strong><br /><strong>modern research"</strong></p><p style="text-align
 : center;">&nbsp;By</p><p style="text-align: center;"><strong>Mr. Peter Lee
 </strong></p><p style="text-align: center;">Director, MIDAS Systems Company
  Limited South Korea</p><p style="text-align: center;">&nbsp;On</p><p style
 ="text-align: center;"><strong>Monday, 17 September 2018</strong></p><p sty
 le="text-align: center;">Time: 02.30 P.M.</p><p style="text-align: center;"
 >&nbsp;Venue: Auditorium</p><p style="text-align: center;"></p> This event 
 was imported from: https://cens.res.in/hi/events/eventdetail/200/-/introduc
 tion-and-range-of-mask-aligner-and-nano-imprint-lithography-for-modern-rese
 arch?tmpl=component
DTSTAMP:20260405T192636Z
DTSTART;TZID=Indian/Mahe:20180917T143000
DTEND;TZID=Indian/Mahe:20180917T153000
SEQUENCE:0
TRANSP:OPAQUE
END:VEVENT
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